1. E-beam lithography exposure conditions for the fabrication of RGB filter based on metal/dielectric subwavelength grating. (August 2016) Authors: Fomchenkov, S A; Butt, M A; Podlipnov, V V; Poletaev, S D; Skidanov, R V; Kazanskiy, N L Journal: Journal of physics Issue: Volume 741(2016) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗