E-beam lithography exposure conditions for the fabrication of RGB filter based on metal/dielectric subwavelength grating. (August 2016)
- Record Type:
- Journal Article
- Title:
- E-beam lithography exposure conditions for the fabrication of RGB filter based on metal/dielectric subwavelength grating. (August 2016)
- Main Title:
- E-beam lithography exposure conditions for the fabrication of RGB filter based on metal/dielectric subwavelength grating
- Authors:
- Fomchenkov, S A
Butt, M A
Podlipnov, V V
Poletaev, S D
Skidanov, R V
Kazanskiy, N L - Abstract:
- Abstract: The main idea of this work was to determine the optimized parameters of E-beam lithography to obtain metal grating over dielectric thin film. This combination of metal/dielectric can provide high transmission spectrum of RGB colors. Different electric flux densities were used during E-beam writing and the best resolution and symmetric periodicity was obtained at 53 μC/cm 2 dose.
- Is Part Of:
- Journal of physics. Volume 741(2016)
- Journal:
- Journal of physics
- Issue:
- Volume 741(2016)
- Issue Display:
- Volume 741, Issue 1 (2016)
- Year:
- 2016
- Volume:
- 741
- Issue:
- 1
- Issue Sort Value:
- 2016-0741-0001-0000
- Page Start:
- Page End:
- Publication Date:
- 2016-08
- Subjects:
- Physics -- Congresses
530.5 - Journal URLs:
- http://www.iop.org/EJ/journal/1742-6596 ↗
http://ioppublishing.org/ ↗ - DOI:
- 10.1088/1742-6596/741/1/012150 ↗
- Languages:
- English
- ISSNs:
- 1742-6588
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5036.223000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 15096.xml