1. Charge trapping effects in nonvolatile memory cells with HfO2/Al2O3 nanolaminated trapping layer. Issue 1 (1st January 2023) Authors: Spassov, D; Paskaleva, A; Guziewicz, E; Stanchev, T; Ivanov, Tz Journal: Journal of physics Issue: Volume 2436 Issue 1(2023) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Comparison of ALD-grown thin ZnO films with various thicknesses for NO2 sensing. (April 2020) Authors: Boyadjiev, S I; Georgieva, V; Szilágyi, I M; Vergov, L; Georgieva, B; Paskaleva, A Journal: Journal of physics Issue: Volume 1492(2020) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Depth profiling of very thin HfO2/Al2O3 stacks by ellipsometry. Issue 1 (1st March 2022) Authors: Karmakov, Y; Paskaleva, A; Spassov, D Journal: Journal of physics Issue: Volume 2240:Issue 1(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Effect of blocking and tunnel oxide layers on the charge trapping properties of MIS capacitors with ALD HfO2/Al2O3 nanolaminated films. Issue 1 (February 2021) Authors: Spassov, D; Paskaleva, A; Guziewicz, E; Wozniak, W; Stanchev, T; Ivanov, Tz; Wojewoda-Budka, J; Janusz-Skuza, M Journal: Journal of physics Issue: Volume 1762:Issue 1(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Electric characterization of transition metal (Co, Ni, Fe) doped ZnO thin layers prepared by atomic layer deposition. Issue 1 (1st January 2023) Authors: Spassov, D; Paskaleva, A; Blagoev, B; Mehandzhiev, V Journal: Journal of physics Issue: Volume 2436 Issue 1(2023) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. Electrical characterization of memory capacitors for nonvolatile memory applications based on nanolaminated HfO2/Al2O3 and Al-doped HfO2 stacks. Issue 1 (1st March 2022) Authors: Spassov, D; Paskaleva, A; Stanchev, T; Ivanov, Tz Journal: Journal of physics Issue: Volume 2240:Issue 1(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
7. Hole and electron trapping in HfO2/Al2O3 nanolaminated stacks for emerging non-volatile flash memories. (18th October 2018) Authors: Spassov, D; Paskaleva, A; Krajewski, T A; Guziewicz, E; Luka, G Journal: Nanotechnology Issue: Volume 29:Number 50(2018) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
8. Interfaces in ALD very thin Al2O3/HfO2 stacks studied by ellipsometry. Issue 1 (1st January 2023) Authors: Karmakov, Y; Paskaleva, A; Spassov, D Journal: Journal of physics Issue: Volume 2436 Issue 1(2023) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
9. Leakage currents in Al2O3/HfO2 multilayer high-k stacks and their modification by post-deposition annealing steps. (March 2019) Authors: Spassov, D; Paskaleva, A; Krajewski, T A; Guziewicz, E; Ivanov, Tz Journal: Journal of physics Issue: Volume 1186(2019) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
10. Magneto-optical characterization of ZnO / Ni nano-laminate obtained via Atomic Layer Deposition. Issue 1 (February 2021) Authors: Buchkov, K; Galluzzi, A; Blagoev, B; Paskaleva, A; Terziyska, P; Stanchev, T; Mehandzhiev, V; Tzvetkov, P; Kovacheva, D; Avramova, I; Nazarova, E; Polichetti, M Journal: Journal of physics Issue: Volume 1762:Issue 1(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗