21. Investigation on defect control for final chemical mechanical polishing of aluminum alloy. (October 2014) Authors: Pan, Guoshun; Gong, Hua; Gu, Zhonghua; Zou, Chunli; Chen, Gaopan Journal: Proceedings of the Institution of Mechanical Engineers Issue: Volume 228:Number 10(2014:Oct.) Page Start: 1151 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
22. Mechanism of GaN CMP Based on H2O2 Slurry Combined with UV Light. (1st January 2015) Authors: Wang, Jie; Wang, Tongqing; Pan, Guoshun; Lu, Xinchun Journal: ECS journal of solid state science and technology Issue: Volume 4:Number 3(2015) Page Start: P112 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
23. Mechanism of GaN CMP Based on H2O2 Slurry Combined with UV Light. (6th February 2015) Authors: Wang, Jie; Wang, Tongqing; Pan, Guoshun; Lu, Xinchun Journal: ECS journal of solid state science and technology Issue: Volume 4:Number 3(2015) Page Start: P112 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
24. One-step fabrication of fine surfaces via femtosecond laser on sliced SiC. (September 2021) Authors: Chen, Gaopan; Li, Jianguo; Luo, Haimei; Zhou, Yan; Peng, Qingfa; Xie, Xiaozhu; Pan, Guoshun Journal: Materials science in semiconductor processing Issue: Volume 132(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
25. Picosecond Laser-Assisted Chemical Mechanical Polishing (CMP): Aiming at the Si-Face of Single-Crystal 6H-SiC Wafer. (23rd April 2021) Authors: Gao, Bin; Guo, Dan; Zhang, Xin; Chen, Gaopan; Pan, Guoshun Journal: ECS journal of solid state science and technology Issue: Volume 10:Number 4(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
26. Preparation of a novel catalyst (SoFeIII) and its catalytic performance towards the removal rate of sapphire substrate during CMP process. (April 2018) Authors: Xu, Li; Zhang, Xin; Kang, Chengxi; Wang, Rongrong; Zou, Chunli; Zhou, Yan; Pan, Guoshun Journal: Tribology international Issue: Volume 120(2018) Page Start: 99 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
27. Study on Pad Performance Deterioration in Chemical Mechanical Polishing (CMP) of Fused Silica. (1st January 2018) Authors: Zhou, Yan; Luo, Haimei; Pan, Guoshun; Zou, Chunli; Luo, Guihai; Chen, Gaopan; Kang, Chengxi Journal: ECS journal of solid state science and technology Issue: Volume 7:Number 6(2018) Page Start: P295 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
28. Study on Pad Performance Deterioration in Chemical Mechanical Polishing (CMP) of Fused Silica. (25th May 2018) Authors: Zhou, Yan; Luo, Haimei; Pan, Guoshun; Zou, Chunli; Luo, Guihai; Chen, Gaopan; Kang, Chengxi Journal: ECS journal of solid state science and technology Issue: Volume 7:Number 6(2018) Page Start: P295 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
29. Study on Pitch Performance Deterioration in Chemical Mechanical Polishing of Fused Silica. (16th August 2021) Authors: Zhou, Yan; Luo, Haimei; Chen, Gaopan; Luo, Guihai; Pan, Guoshun Journal: ECS journal of solid state science and technology Issue: Volume 10:Number 8(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
30. The Cycle Characteristics of Slurries in Chemical Mechanical Polishing (CMP) of Fused Silica. Issue 30 (11th August 2020) Authors: Kang, Chengxi; Gao, Bin; Guo, Dan; Luo, Haimei; Pan, Guoshun Journal: ChemistrySelect Issue: Volume 5:Issue 30(2020) Page Start: 9350 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗