Author/Creator: Nakamura, Yusui - British Library Electronic Legal Deposit Catalogue-Journal Issues and Articles Search Results

Author/Creator Nakamura, Yusui

1. GaN-based MIS-HEMTs with Al2O3 dielectric deposited by low-cost and environmental-friendly mist-CVD technique. (16th February 2021)

Authors:: Low, Rui Shan; Asubar, Joel T.; Baratov, Ali; Kamiya, Shunsuke; Nagase, Itsuki; Urano, Shun; Kawabata, Shinsaku; Tokuda, Hirokuni; Kuzuhara, Masaaki; Nakamura, Yusui; Naito, Kenta; Motoyama, Tomohiro; Yatabe, Zenji
Journal:: Applied physics express
Issue:: Volume 14:Number 3(2021)
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Record Type:: Journal Article
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2. Improvement of m‐plane ZnO films formed on buffer layers on sapphire substrates by mist chemical vapor deposition. Issue 3 (5th January 2017)

Authors:: Tanoue, Hironobu; Takenouchi, Masato; Yamashita, Tatsuya; Wada, Shohei; Yatabe, Zenji; Nagaoka, Shoji; Naka, Yoshihiro; Nakamura, Yusui
Journal:: Physica status solidi
Issue:: Volume 214:Issue 3(2017)
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Record Type:: Journal Article
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3. Single crystalline SnO2 thin films grown on m ‐plane sapphire substrate by mist chemical vapor deposition. Issue 1 (14th November 2016)

Authors:: Yatabe, Zenji; Tsuda, Takaaki; Matsushita, Junya; Sato, Takehide; Otabe, Tatsuya; Sue, Koji; Nagaoka, Shoji; Nakamura, Yusui
Journal:: Physica status solidi
Issue:: Volume 14:Issue 1/2(2017)
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Record Type:: Journal Article
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4. Structural characteristics of a non-polar ZnS layer on a ZnO buffer layer formed on a sapphire substrate by mist chemical vapor deposition. (16th May 2018)

Authors:: Okita, Koshi; Inaba, Katsuhiko; Yatabe, Zenji; Nakamura, Yusui
Journal:: Japanese journal of applied physics
Issue:: Volume 57:Number 6(2018)
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Record Type:: Journal Article
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5. Synthesis and characterization of mist chemical vapor deposited aluminum titanium oxide films. (28th June 2019)

Authors:: Yatabe, Zenji; Nishiyama, Koshi; Tsuda, Takaaki; Nishimura, Kazuki; Nakamura, Yusui
Journal:: Japanese journal of applied physics
Issue:: Volume 58:Number 7(2019)
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Record Type:: Journal Article
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6. Uniform ZnO epitaxial films formed at atmospheric pressure by high-speed rotation-type mist chemical vapor deposition. (18th November 2015)

Authors:: Tanoue, Hironobu; Taniguchi, Takuya; Wada, Shohei; Yamamoto, Shinya; Nakamura, Shohei; Naka, Yoshihiro; Yoshikawa, Hiroyuki; Munekata, Mizue; Nagaoka, Shoji; Nakamura, Yusui
Journal:: Applied physics express
Issue:: Volume 8:Number 12(2015:Dec.)
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Record Type:: Journal Article
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