Author/Creator: LiN, Tai Zhe - British Library Electronic Legal Deposit Catalogue-Journal Issues and Articles Search Results

Author/Creator LiN, Tai Zhe

1. Controlled MoS2 layer etching using CF4 plasma. (12th August 2015)

Authors:: Jeon, Min Hwan; Ahn, Chisung; Kim, HyeongU; Kim, Kyong Nam; LiN, Tai Zhe; Qin, Hongyi; Kim, Yeongseok; Lee, Sehan; Kim, Taesung; Yeom, Geun Young
Journal:: Nanotechnology
Issue:: Volume 26:Number 35(2015)
Page Start:
Record Type:: Journal Article
View Content:: Available online (eLD content is only available in our Reading Rooms) ↗

2. Controlled MoS2 layer etching using CF4 plasma. (4th September 2015)

Authors:: Jeon, Min Hwan; Ahn, Chisung; Kim, HyeongU; Kim, Kyong Nam; LiN, Tai Zhe; Qin, Hongyi; Kim, Yeongseok; Lee, Sehan; Kim, Taesung; Yeom, Geun Young
Journal:: Nanotechnology
Issue:: Volume 26:Number 35(2015)
Page Start:: 263
Record Type:: Journal Article
View Content:: Available online (eLD content is only available in our Reading Rooms) ↗