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You searched for: Author/Creator Lenski, Markus

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1. Advantages of Faceted P-Raised Source/Drain in Fully Depleted Silicon on Insulator Technology. (20th July 2018)

2. AES and Related Techniques for Yield Improvement, Metrology and Development Support of ULSI Circuits Manufactured in ≤ 28nm CMOS Technology. (August 2014)

3. AES and Related Techniques for Yield Improvement, Metrology and Development Support of ULSI Circuits Manufactured in ≤ 28nm CMOS Technology. (August 2014)

5. Contrast enhancement is a prognostic factor in IDH1/2 mutant, but not in wild-type WHO grade II/III glioma as confirmed by machine learning. (January 2019)

9. Inflammatory Markers in Serum and Cerebrospinal Fluid for Early Detection of External Ventricular Drain–associated Ventriculitis in Patients With Subarachnoid Hemorrhage. Issue 2 (April 2019)