1. Comparison of wet chemical treatment and Ar-ion sputtering for GaInP2(100) surface preparation. (15th August 2016) Authors: Lebedev, Mikhail V.; Kalyuzhnyy, Nikolay A.; Mintairov, Sergey A.; Calvet, Wolfram; Kaiser, Bernhard; Jaegermann, Wolfram Journal: Materials science in semiconductor processing Issue: Volume 51(2016:Aug.) Page Start: 81 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗