1. The effect of SF6 addition in a Cl2/Ar inductively coupled plasma for deep titanium etching. (8th March 2018) Authors: Laudrel, E; Tillocher, T; Meric, Y; Lefaucheux, P; Boutaud, B; Dussart, R Journal: Journal of micromechanics and microengineering Issue: Volume 28:Number 5(2018:May) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗