Author/Creator: Kim, Tae-Gon - British Library Electronic Legal Deposit Catalogue-Journal Issues and Articles Search Results

Author/Creator Kim, Tae-Gon

1. A Breakthrough Method for the Effective Conditioning of PVA Brush Used for Post-CMP Process. (1st January 2019)

Authors:: Lee, Jung-Hwan; Ryu, Heon-Yul; Hwang, Jun-Kil; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Hamada, Satomi; Wada, Yutaka; Hiyama, Hirokuni; Park, Jin-Goo
Journal:: ECS journal of solid state science and technology
Issue:: Volume 8:Number 6(6019)
Page Start:: P307
Record Type:: Journal Article
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2. A Breakthrough Method for the Effective Conditioning of PVA Brush Used for Post-CMP Process. (5th June 2019)

Authors:: Lee, Jung-Hwan; Ryu, Heon-Yul; Hwang, Jun-Kil; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Hamada, Satomi; Wada, Yutaka; Hiyama, Hirokuni; Park, Jin-Goo
Journal:: ECS journal of solid state science and technology
Issue:: Volume 8:Number 6(6019)
Page Start:: P307
Record Type:: Journal Article
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3. Characterization of Different Cobalt Surfaces and Interactions with Benzotriazole for CMP Application. (13th July 2020)

Authors:: Ryu, Heon-Yul; Lee, Chan-Hee; Hwang, Jun-Kil; Cho, Hwi-Won; Prasad, Nagendra Yerriboina; Kim, Tae-Gon; Hamada, Satomi; Park, Jin-Goo
Journal:: ECS journal of solid state science and technology
Issue:: Volume 9:Number 6(2020)
Page Start:
Record Type:: Journal Article
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4. Comparative evaluation of organic contamination sources from roller and pencil type PVA brushes during the Post-CMP cleaning process. (October 2020)

Authors:: Lee, Jung-Hwan; Poddar, Maneesh Kumar; Han, Kwang-Min; Ryu, Heon-Yul; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Wada, Yutaka; Hamada, Satomi; Hiyama, Hirokuni; Park, Jin-Goo
Journal:: Polymer testing
Issue:: Volume 90(2020)
Page Start:
Record Type:: Journal Article
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5. Contamination Mechanism of Ceria Particles on the Oxide Surface after the CMP Process. (16th December 2020)

Authors:: Han, Kwang-Min; Han, So-Young; Sahir, Samrina; Yerriboina, Nagendra Prasad; Kim, Tae-Gon; Mahadev, Niraj; Park, Jin-Goo
Journal:: ECS journal of solid state science and technology
Issue:: Volume 9:Number 12(2020)
Page Start:
Record Type:: Journal Article
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6. Effect of ammonium halide salts on wet chemical nanoscale etching and polishing of InGaAs surfaces for advanced CMOS devices. (July 2023)

Authors:: Samanta, Suprakash; Jin, Seungwan; Lee, Chan-Hee; Lee, Seong-Soo; Struyf, Herbert; Kim, Tae-Gon; Park, Jin-Goo
Journal:: Applied geography
Issue:: Volume 161(2023)
Page Start:
Record Type:: Journal Article
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7. Effect of cutting edge geometry change due to tool wear on hole quality in drilling of carbon fiber reinforced plastics using advanced ceramic coated tools. (January 2022)

Authors:: Bin Abdullah, Mohammad Sayem; Kim, Dave; Kwon, Patrick; Kim, Tae-Gon
Journal:: Proceedings of the Institution of Mechanical Engineers
Issue:: Volume 236:Number 1(2022)
Page Start:: 302
Record Type:: Journal Article
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8. Effect of fiber bending induced matrix shear behavior on machined surface quality in carbon fiber reinforced plastic milling. (1st May 2022)

Authors:: Kim, Gyuho; Song, Kyeongeun; Jun, Martin Byung-Guk; Jeong, Young Hun; Kim, Tae-Gon; Min, Byung-Kwon
Journal:: Composite structures
Issue:: Volume 287(2022)
Page Start:
Record Type:: Journal Article
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9. Effect of Skin Layer on Brush Loading, Cross-Contamination, and Cleaning Performance during Post-CMP Cleaning. (1st May 2022)

Authors:: Sahir, Samrina; Cho, Hwi-Won; Jalalzai, Palwasha; Peter, Jerome; Singh, Randeep; Hamada, Satomi; Kim, Tae-Gon; Park, Jin-Goo
Journal:: ECS journal of solid state science and technology
Issue:: Volume 11:Number 5(2022)
Page Start:
Record Type:: Journal Article
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10. Effect of Slurry Additives on Co-BTA Complex Stability and Inhibition Property During Co CMP Process. (1st August 2022)

Authors:: Jalalzai, Palwasha; Ryu, Heon-Yul; Sahir, Samrina; Meethal, Ranjith Punathil; Hamada, Satomi; Kim, Tae-Gon; Park, Jin-Goo
Journal:: ECS journal of solid state science and technology
Issue:: Volume 11:Number 8(2022)
Page Start:
Record Type:: Journal Article
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