1. Growth chemistry of cobalt nitride by plasma enhanced atomic layer deposition. (1st October 2022) Authors: O'Donnell, S; Snelgrove, M; Shiel, K; Weiland, C; Hughes, G; Woicik, J; O'Neill, D; Jose, F; McFeely, C; O'Connor, R Journal: Materials research express Issue: Volume 9:Number 10(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance. (16th November 2021) Authors: O'Donnell, S; Jose, F; Shiel, K; Snelgrove, M; McFeely, C; McGill, E; O'Connor, R Journal: Journal of physics Issue: Volume 55:Number 8(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗