1. 55‐3: Development of Low‐Temperature Metal Dry‐Etching Equipment via ECR Plasma Source. Issue 1 (28th June 2022) Authors: Kim, Chiwoo; Jung, Jae Hoon; Jang, Jin Nyoung; Lee, Jong Hwa; Jung, Kiro; Yoon, Ho-Won; Lee, Sangheon; Kim, Donghoon; Hong, Mun-Pyo; Kim, Sang-Gab; Jang, Soo Ouk Journal: Digest of technical papers Issue: Volume 53:Issue 1(2022) Page Start: 729 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗