1. 41.1: Invited Paper: Efficient pre‐treatment for improving the via hole profile in 4‐mask process TFT architecture. (4th October 2019) Authors: Zhen, Liu; An-Thung, Cho; Hejing, Zhang; Fengyun, Yang; Kaijun, Liu; Qionghua, Mo; Chao, Wei; Wanfei, Yong; James, Hsu Journal: Digest of technical papers Issue: Volume 50(2019)Supplement 1 Page Start: 456 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. P‐6.9: High‐reliability a‐Si:H TFT with Repressing Photo‐degradation on G8.6 LCDs. (4th October 2019) Authors: Chao, Wei; An-Thung, Cho; Hejing, Zhang; Qionghua, Mo; Zhen, Liu; Fengyun, Yang; Kaijun, Liu; James, Hsu Journal: Digest of technical papers Issue: Volume 50(2019)Supplement 1 Page Start: 779 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗