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Author/Creator Jackson, David H. K.

1. Back Cover: Stabilization of Copper Catalysts for Liquid‐Phase Reactions by Atomic Layer Deposition (Angew. Chem. Int. Ed. 51/2013). Issue 51 (28th November 2013)

Authors:
O'Neill, Brandon J.; Jackson, David H. K.; Crisci, Anthony J.; Farberow, Carrie A.; Shi, Fengyuan; Alba‐Rubio, Ana C.; Lu, Junling; Dietrich, Paul J.; Gu, Xiangkui; Marshall, Christopher L.; Stair, Peter C.; Elam, Jeffrey W.; Miller, Jeffrey T.; Ribeiro, Fabio H.; Voyles, Paul M.; Greeley, Jeffre...
Journal:
Angewandte Chemie international edition
Issue:
Volume 52:Issue 51(2013)
Page Start:
13824
Record Type:
Journal Article
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4. Electrocatalysts: In Situ Electrochemical Activation of Atomic Layer Deposition Coated MoS2 Basal Planes for Efficient Hydrogen Evolution Reaction (Adv. Funct. Mater. 34/2017). (11th September 2017)

Authors:
Kim, Youngmin; Jackson, David H. K.; Lee, Daewon; Choi, Min; Kim, Tae‐Wan; Jeong, Soon‐Yong; Chae, Ho‐Jeong; Kim, Hyun Woo; Park, Noejung; Chang, Hyunju; Kuech, Thomas F.; Kim, Hyung Ju
Journal:
Advanced functional materials
Issue:
Volume 27:Number 34(2017)
Page Start:
n/a
Record Type:
Journal Article
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5. In Situ Electrochemical Activation of Atomic Layer Deposition Coated MoS2 Basal Planes for Efficient Hydrogen Evolution Reaction. (2nd August 2017)

Authors:
Kim, Youngmin; Jackson, David H. K.; Lee, Daewon; Choi, Min; Kim, Tae‐Wan; Jeong, Soon‐Yong; Chae, Ho‐Jeong; Kim, Hyun Woo; Park, Noejung; Chang, Hyunju; Kuech, Thomas F.; Kim, Hyung Ju
Journal:
Advanced functional materials
Issue:
Volume 27:Number 34(2017)
Page Start:
n/a
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗

6. Rücktitelbild: Stabilization of Copper Catalysts for Liquid‐Phase Reactions by Atomic Layer Deposition (Angew. Chem. 51/2013). (28th November 2013)

Authors:
O'Neill, Brandon J.; Jackson, David H. K.; Crisci, Anthony J.; Farberow, Carrie A.; Shi, Fengyuan; Alba‐Rubio, Ana C.; Lu, Junling; Dietrich, Paul J.; Gu, Xiangkui; Marshall, Christopher L.; Stair, Peter C.; Elam, Jeffrey W.; Miller, Jeffrey T.; Ribeiro, Fabio H.; Voyles, Paul M.; Greeley, Jeffre...
Journal:
Angewandte Chemie
Issue:
Volume 125:Number 51(2013)
Page Start:
14068
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗

7. Stabilization of Copper Catalysts for Liquid‐Phase Reactions by Atomic Layer Deposition1. (26th November 2013)

Authors:
O'Neill, Brandon J.; Jackson, David H. K.; Crisci, Anthony J.; Farberow, Carrie A.; Shi, Fengyuan; Alba‐Rubio, Ana C.; Lu, Junling; Dietrich, Paul J.; Gu, Xiangkui; Marshall, Christopher L.; Stair, Peter C.; Elam, Jeffrey W.; Miller, Jeffrey T.; Ribeiro, Fabio H.; Voyles, Paul M.; Greeley, Jeffre...
Journal:
Angewandte Chemie
Issue:
Volume 125:Number 51(2013)
Page Start:
14053
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗

8. Stabilization of Copper Catalysts for Liquid‐Phase Reactions by Atomic Layer Deposition1. Issue 51 (26th November 2013)

Authors:
O'Neill, Brandon J.; Jackson, David H. K.; Crisci, Anthony J.; Farberow, Carrie A.; Shi, Fengyuan; Alba‐Rubio, Ana C.; Lu, Junling; Dietrich, Paul J.; Gu, Xiangkui; Marshall, Christopher L.; Stair, Peter C.; Elam, Jeffrey W.; Miller, Jeffrey T.; Ribeiro, Fabio H.; Voyles, Paul M.; Greeley, Jeffre...
Journal:
Angewandte Chemie international edition
Issue:
Volume 52:Issue 51(2013)
Page Start:
13808
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗