1. (Invited) Technology Options to Reduce Contact Resistance in Nanoscale III-V MOSFETs. (31st March 2015) Authors: Lee, Rinus T.P.; Loh, Wei Yip; Tieckelmann, Robert; Orzali, Tommaso; Huffman, Craig; Vert, Alexey; Huang, Gensheng; Kelman, Maxim; Karim, Zia; Hobbs, Chris; Hill, Richard J.W.; Papa Rao, S.S. Journal: ECS transactions Issue: Volume 66:Number 4(2015) Page Start: 125 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗