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Author/Creator Hartmann, J.M.

1. Benefits of XPS nanocharacterization for process development and industrial control of thin SiGe channel layers in advanced CMOS technologies. (1st November 2017)

Authors:
Fauquier, L.; Pelissier, B.; Jalabert, D.; Pierre, F.; Hartmann, J.M.; Rozé, F.; Doloy, D.; Le Cunff, D.; Beitia, C.; Baron, T.
Journal:
Materials science in semiconductor processing
Issue:
Volume 70(2017)
Page Start:
105
Record Type:
Journal Article
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Available online (eLD content is only available in our Reading Rooms) ↗

2. Germanium based photonic components toward a full silicon/germanium photonic platform. Issue 2 (June 2017)

Authors:
Reboud, V.; Gassenq, A.; Hartmann, J.M.; Widiez, J.; Virot, L.; Aubin, J.; Guilloy, K.; Tardif, S.; Fédéli, J.M.; Pauc, N.; Chelnokov, A.; Calvo, V.
Journal:
Progress in crystal growth and characterization of materials
Issue:
Volume 63:Issue 2(2017)
Page Start:
1
Record Type:
Journal Article
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Available online (eLD content is only available in our Reading Rooms) ↗

4. Nanopackaging solution from clean room to UHV Environment: Hydrogen Passivated Si (100) Substrate Fabrication and Use for Atomic Scale Investigations and Self-Assembled Monolayer Grafting. (2016)

Authors:
Reynaud, P.; Thuaire, A.; Sordes, D.; Rauer, C.; Hartmann, J.M.; Moriceau, H.; Bhartia, B.; Puniredd, S.R.; Troadec, C.; Srinivasan, M.P.; Baillin, X.; Cheramy, S.
Journal:
Procedia engineering
Issue:
Volume 141(2016)
Page Start:
121
Record Type:
Journal Article
View Content:
Available online (eLD content is only available in our Reading Rooms) ↗