1. Advantages of a slim vertical gas channel at high SiHCl3 concentrations for atmospheric pressure silicon epitaxial growth. (15th November 2018) Authors: Irikura, Kenta; Muroi, Mitsuko; Yamada, Ayami; Matsuo, Miya; Habuka, Hitoshi; Ishida, Yuuki; Ikeda, Shin-Ichi; Hara, Shiro Journal: Materials science in semiconductor processing Issue: Volume 87(2018) Page Start: 13 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Anticorrosive Behavior of Aluminum Nitride Surface Exposed to Chlorine Trifluoride Gas at High Temperatures. (8th March 2021) Authors: Haruguchi, Miyu; Hayashi, Masaya; Irikura, Kenta; Habuka, Hitoshi; Takahashi, Yoshinao Journal: ECS journal of solid state science and technology Issue: Volume 10:Number 3(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Anticorrosive Behavior of SiCxNyOz Film Formed by Non-Heat Assistance Plasma-Enhanced Chemical Vapor Deposition Using Monomethylsilane, Nitrogen and Argon Gases. (2nd January 2020) Authors: Watanabe, Toru; Hori, Kenta; Habuka, Hitoshi Journal: ECS journal of solid state science and technology Issue: Volume 9:Number 2(2020) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Behavior of Viscous Liquid Byproduct Formed in Exhaust Tube by Silicon Carbide Epitaxial Growth. (16th December 2019) Authors: Mizushima, Ichiro; Habuka, Hitoshi Journal: ECS journal of solid state science and technology Issue: Volume 8:Number 12(2019) Page Start: P805 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Behavior of Viscous Liquid Byproduct Formed in Exhaust Tube by Silicon Carbide Epitaxial Growth. (1st January 2019) Authors: Mizushima, Ichiro; Habuka, Hitoshi Journal: ECS journal of solid state science and technology Issue: Volume 8:Number 12(2019) Page Start: P805 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. Boron-Silicon Film Chemical Vapor Deposition Using Boron Trichloride, Dichlorosilane and Monomethylsilane Gases. (16th June 2021) Authors: Muroi, Mitsuko; Otani, Mana; Habuka, Hitoshi Journal: ECS journal of solid state science and technology Issue: Volume 10:Number 6(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
7. By-Product Formation in a Trichlorosilane-Hydrogen System for Silicon Film Deposition. (13th November 2014) Authors: Habuka, Hitoshi; Sakurai, Ayumi; Saito, Ayumi Journal: ECS journal of solid state science and technology Issue: Volume 4:Number 2(2015) Page Start: P16 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
8. By-Product Formation in a Trichlorosilane-Hydrogen System for Silicon Film Deposition. (1st January 2015) Authors: Habuka, Hitoshi; Sakurai, Ayumi; Saito, Ayumi Journal: ECS journal of solid state science and technology Issue: Volume 4:Number 2(2015) Page Start: P16 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
9. Chemical Conditions of SiCNO Film Exposed to ClF3 Gas. (4th October 2021) Authors: Hori, Kenta; Kawakami, Hiroki; Habuka, Hitoshi Journal: ECS journal of solid state science and technology Issue: Volume 10:Number 10(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
10. Design of a Silicon Carbide Chemical Vapor Deposition Reactor Cleaning Process Using Chlorine Trifluoride Gas Accounting for Exothermic Reaction Heat. (29th October 2020) Authors: Hayashi, Masaya; Mamyouda, Takumi; Habuka, Hitoshi; Ishiguro, Akio; Ishii, Shigeaki; Daigo, Yoshiaki; Ito, Hideki; Mizushima, Ichiro; Takahashi, Yoshinao Journal: ECS journal of solid state science and technology Issue: Volume 9:Number 10(2020) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗