Search

Search Constraints

You searched for: Author/Creator Goodyear, Andy

Search Results

4. Atomic layer etching of SiO2 with Ar and CHF 3 plasmas: A self‐limiting process for aspect ratio independent etching. Issue 9 (22nd May 2019)

5. Mitigation of plasma-induced damage in porous low-k dielectrics by cryogenic precursor condensation. (1st April 2016)