1. P‐7.9: Advanced Halftone Photolithography Using Four‐Mask Process Architecture for G8.6 TFT‐LCDs. (4th October 2019) Authors: Cho, An-Thung; Yang, Feng-yun; Liu, Zhen; Chao, Wei; Mo, Qiong-hua; Liu, Kai-jun; Ge, Bang-tong; Fu, Ting-ting; Zhou, Jeff; Hsu, James; Chen, Wade; Lu, York Journal: Digest of technical papers Issue: Volume 50(2019)Supplement 1 Page Start: 822 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. P‐75: Advanced Halftone Photolithography Using Four‐Mask Process Architecture for G8.6 TFT‐LCDs. Issue 1 (30th May 2018) Authors: Cho, An-Thung; Hsu, James; Zhou, Jeff; Hong, Jinn; Yang, Feng-yun; Luo, Yan-mei; Tian, Yi-qun; Lei, Dan; Liu, Zhen; Mo, Qiong-hua; Liu, Kai-jun; Ge, Bang-tong; Long, Feng-xiang; Fu, Ting-ting; Li, Min; Chen, Wade; Lu, York Journal: Digest of technical papers Issue: Volume 49:Issue 1(2018) Page Start: 1471 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗