P‐75: Advanced Halftone Photolithography Using Four‐Mask Process Architecture for G8.6 TFT‐LCDs. Issue 1 (30th May 2018)

• Record Type: Journal Article
• Authors: Cho, An-Thung; Hsu, James; Zhou, Jeff; Hong, Jinn; Yang, Feng-yun; Luo, Yan-mei; Tian, Yi-qun; Lei, Dan; Liu, Zhen; Mo, Qiong-hua; Liu, Kai-jun; Ge, Bang-tong; Long, Feng-xiang; Fu, Ting-ting; Li, Min; Chen, Wade; Lu, York
• Is Part Of: Digest of technical papers. Volume 49:Issue 1(2018)
• Page Start: 1471
• Page End: 1474
• Publication Date: 2018-05-30
• Subjects: Four-mask technology -- Halftone Photolithography -- Data line open -- Photoresist peeling -- Acid value; Information display systems -- Congresses; 621.3815422
• DOI: 10.1002/sdtp.12240
• Languages: English
• ISSNs: 0097-966X

Abstract

Abstract : Advanced four‐mask process a‐Si TFT array manufacturing method and good TFT stability is presented in this paper. We used an optimum half‐tone mask transmittance and half‐tone photoresist for the four‐mask process architecture. Data line open and photoresist peeling issues occurred in G8.6 TFT‐LCDs and solutions will be shown.