1. Cooperative simulation of lithography and topography for three-dimensional high-aspect-ratio etching. (11th April 2018) Authors: Ichikawa, Takashi; Yagisawa, Takashi; Furukawa, Shinichi; Taguchi, Takafumi; Nojima, Shigeki; Murakami, Sadatoshi; Tamaoki, Naoki Journal: Japanese journal of applied physics Issue: Volume 57:Number 6(2018)Supplement 2 Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗