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5. Combined analysis methods for investigating titanium and nickel surface contamination after plasma deep etching. (11th November 2021)

6. Definition of a new (Doniach‐Sunjic‐Shirley) peak shape for fitting asymmetric signals applied to reduced graphene oxide/graphene oxide XPS spectra. (18th October 2021)

10. Summary of ISO/TC 201 International Standard ISO 18516:2019 Surface chemical analysis—Determination of lateral resolution and sharpness in beam‐based methods with a range from nanometres to micrometres and its implementation for imaging laboratory X‐ray photoelectron spectrometers (XPS). (22nd October 2021)