1. Atomic Layer Deposition of Cerium Dioxide Film on TiN and Si Substrates: Structural and Chemical Properties. (5th June 2017) Authors: Vangelista, Silvia; Piagge, Rossella; Ek, Satu; Sarnet, Tiina; Ghidini, Gabriella; Lamperti, Alessio Journal: MRS advances Issue: Volume 2:Number 52(2017) Page Start: 3005 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗