1. Characterization of PECVD ultralow dielectric constant porous SiOCH films using triethoxymethylsilane precursor and cinene porogen. (23rd February 2018) Authors: Ding, Zi-Jun; Wang, Yong-Ping; Liu, Wen-Jun; Ding, Shi-Jin; Baklanov, Mikhail R; Zhang, David Wei Journal: Journal of physics Issue: Volume 51:Number 11(2018) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Energy-efficient flexible photoelectric device with 2D/0D hybrid structure for bio-inspired artificial heterosynapse application. (May 2021) Authors: Meng, Jia-Lin; Wang, Tian-Yu; Chen, Lin; Sun, Qing-Qing; Zhu, Hao; Ji, Li; Ding, Shi-Jin; Bao, Wen-Zhong; Zhou, Peng; Zhang, David Wei Journal: Nano energy Issue: Volume 83(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Enhanced photovoltaic performance of inverted pyramid-based nanostructured black-silicon solar cells passivated by an atomic-layer-deposited Al2O3 layer. Issue 37 (5th August 2015) Authors: Chen, Hong-Yan; Lu, Hong-Liang; Ren, Qing-Hua; Zhang, Yuan; Yang, Xiao-Feng; Ding, Shi-Jin; Zhang, David Wei Journal: Nanoscale Issue: Volume 7:Issue 37(2015) Page Start: 15142 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Flexible boron nitride-based memristor for in situ digital and analogue neuromorphic computing applications. Issue 2 (13th January 2021) Authors: Meng, Jia-Lin; Wang, Tian-Yu; He, Zhen-Yu; Chen, Lin; Zhu, Hao; Ji, Li; Sun, Qing-Qing; Ding, Shi-Jin; Bao, Wen-Zhong; Zhou, Peng; Zhang, David Wei Journal: Materials horizons Issue: Volume 8:Issue 2(2021) Page Start: 538 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Fully transparent, flexible and waterproof synapses with pattern recognition in organic environments. Issue 6 (19th June 2019) Authors: Wang, Tian-Yu; Meng, Jia-Lin; He, Zhen-Yu; Chen, Lin; Zhu, Hao; Sun, Qing-Qing; Ding, Shi-Jin; Zhou, Peng; Zhang, David Wei Journal: Nanoscale horizons Issue: Volume 4:Issue 6(2019) Page Start: 1293 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. Hafnium Oxide‐Based Ferroelectric Devices for Computing‐in‐Memory Applications. Issue 9 (26th February 2021) Authors: Chen, Pei-Yao; He, Zheng-Yu; Cha, Ming-Yang; Liu, Hao; Zhu, Hao; Chen, Lin; Sun, Qing-Qing; Ding, Shi-Jin; Zhang, David Wei Journal: Physica status solidi Issue: Volume 218:Issue 9(2021) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
7. High-bandwidth light inputting multilevel photoelectric memory based on thin-film transistor with a floating gate of CsPbBr3/CsPbI3 blend quantum dots. (7th December 2020) Authors: Pei, Junxiang; Wu, Xiaohan; Huo, Jingyong; Liu, Wen-Jun; Zhang, David Wei; Ding, Shi-Jin Journal: Nanotechnology Issue: Volume 32:Number 9(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
8. High-bandwidth light inputting multilevel photoelectric memory based on thin-film transistor with a floating gate of CsPbBr3/CsPbI3 blend quantum dots. (7th December 2020) Authors: Pei, Junxiang; Wu, Xiaohan; Huo, Jingyong; Liu, Wen-Jun; Zhang, David Wei; Ding, Shi-Jin Journal: Nanotechnology Issue: Volume 32:Number 9(2021) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
9. Influence of NH3 annealing on the chemical states of HfO2/Al2O3 stacks studied by X-ray photoelectron spectroscopy. (February 2016) Authors: Liu, Jian-Shuang; Lu, Hong-Liang; Xu, Sai-Sheng; Wang, Peng-Fei; Ding, Shi-Jin; Zhang, David Wei Journal: Vacuum Issue: Volume 124(2016) Page Start: 60 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
10. Influence of NH3 annealing on the chemical states of HfO2/Al2O3 stacks studied by X-ray photoelectron spectroscopy. (February 2016) Authors: Liu, Jian-Shuang; Lu, Hong-Liang; Xu, Sai-Sheng; Wang, Peng-Fei; Ding, Shi-Jin; Zhang, David Wei Journal: Vacuum Issue: Volume 124(2016) Page Start: 60 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗