1. RF bias to suppress post-oxidation of μc-Si:H films deposited by inductively-coupled plasma using a planar RF resonant antenna. (January 2018) Authors: Demolon, P.; Guittienne, Ph.; Howling, A.A.; Jost, S.; Jacquier, R.; Furno, I. Journal: Vacuum Issue: Volume 147(2018) Page Start: 58 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗