1. Nanoscale surface engineering of a high-k ZrO2/SiO2 gate insulator for a high performance ITZO TFT via plasma-enhanced atomic layer deposition. Issue 38 (15th September 2020) Authors: Choi, Wan-Ho; Jeon, Woojin; Park, Jin-Seong Journal: Journal of materials chemistry Issue: Volume 8:Issue 38(2020) Page Start: 13342 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Plasma Enhanced atomic layer deposited amorphous gallium oxide thin films using novel trimethyl[N-(2-methoxyethyl)-2-methylpropan-2-amine]gallium. Issue 2 (15th January 2021) Authors: Hong, TaeHyun; Choi, Wan-Ho; Choi, Su-Hwan; Lee, HyunKyung; Seok, Jang Hyeon; Park, Jung Woo; Lim, Jun Hyung; Park, Jin-Seong Journal: Ceramics international Issue: Volume 47:Issue 2(2021) Page Start: 1588 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Review of recent progresses on flexible oxide semiconductor thin film transistors based on atomic layer deposition processes *Project supported by the National Research Foundation of Korea (NRF) (No. NRF-2017R1D1A1B03034035), the Ministry of Trade, Industry & Energy (No. #10051403), and the Korea Semiconductor Research Consortium. (January 2018) Authors: Sheng, Jiazhen; Han, Ki-Lim; Hong, TaeHyun; Choi, Wan-Ho; Park, Jin-Seong Journal: Journal of semiconductors Issue: Volume 39:Number 1(2018:Jan.) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. The impact of plasma-enhanced atomic layer deposited ZrSiOx insulators on low voltage operated In-Sn-Zn-O thin film transistors. Issue 15 (15th October 2019) Authors: Kim, MinJung; Jeong, Hyun-Jun; Sheng, Jiazhen; Choi, Wan-Ho; Jeon, Woojin; Park, Jin-Seong Journal: Ceramics international Issue: Volume 45:Issue 15(2019) Page Start: 19166 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗