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Author/Creator Cho, Taeyoung

1. Cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing. Issue 9 (27th June 2019)

Authors:
Park, Seolhye; Kyung, Yunyoung; Lee, Juyoung; Jang, Yongsuk; Cha, Taewon; Noh, Yeongil; Choi, Younghoon; Kim, Byungsoo; Cho, Taeyoung; Seo, Rabul; Yang, Jae‐Ho; Jang, Yunchang; Ryu, Sangwon; Kim, Gon‐Ho
Other Names:
Hamaguchi Satoshi guestEditor.; Agarwal Sumit guestEditor.; Zajickova Lenka guestEditor.
Journal:
Plasma processes and polymers
Issue:
Volume 16:Issue 9(2019)
Page Start:
n/a
Record Type:
Journal Article
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