1. Substrate temperature influenced ZrO2 films for MOS devices. (28th March 2020) Authors: Kondaiah, Paruchuri; Jagadeesh Chandra, S.V.; Fortunato, Elvira; Chel Jong, Choi; Mohan Rao, G.; Koti Reddy, D.V. Rama; Uthanna, S. Journal: Surface and interface analysis Issue: Volume 52:Number 9(2020) Page Start: 541 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗