1. Cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing. Issue 9 (27th June 2019) Authors: Park, Seolhye; Kyung, Yunyoung; Lee, Juyoung; Jang, Yongsuk; Cha, Taewon; Noh, Yeongil; Choi, Younghoon; Kim, Byungsoo; Cho, Taeyoung; Seo, Rabul; Yang, Jae‐Ho; Jang, Yunchang; Ryu, Sangwon; Kim, Gon‐Ho Other Names: Hamaguchi Satoshi guestEditor.; Agarwal Sumit guestEditor.; Zajickova Lenka guestEditor. Journal: Plasma processes and polymers Issue: Volume 16:Issue 9(2019) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗