1. Frequency and Area Dependence of High-K/Ge MOS Capacitors. (7th July 2017) Authors: Mitevski, Ivan; Misra, Durga; Bhuyian, M. N.; Ding, Yiming Journal: ECS transactions Issue: Volume 77:Number 11(2017) Page Start: 1977 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Post Plasma Oxidation Processed ALD Al2O3/Hf1-xZrxO2 Thin Films on Ge Substrates: Reliability. (12th January 2018) Authors: Bhuyian, M. N.; Shao, P.; Sengupta, A.; Ding, Y.; Misra, D.; Tapily, K.; Clark, R. D.; Consiglio, S.; Wajda, C. S.; Leusink, G. J. Journal: ECS journal of solid state science and technology Issue: Volume 7:Number 2(2018) Page Start: N1 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Post Plasma Oxidation Processed ALD Al2O3/Hf1-xZrxO2 Thin Films on Ge Substrates: Reliability. (1st January 2018) Authors: Bhuyian, M. N.; Shao, P.; Sengupta, A.; Ding, Y.; Misra, D.; Tapily, K.; Clark, R. D.; Consiglio, S.; Wajda, C. S.; Leusink, G. J. Journal: ECS journal of solid state science and technology Issue: Volume 7:Number 2(2018) Page Start: N1 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗