1. Fabrication of Highly Resistive NiO Thin Films for Nanoelectronic Applications. Issue 1 (31st October 2022) Authors: Mohr, Johannes; Hennen, Tyler; Bedau, Daniel; Nag, Joyeeta; Waser, Rainer; Wouters, Dirk J. Journal: ADVANCED PHYSICS RESEARCH Issue: Volume 1:Issue 1(2022) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗