Cite
HARVARD Citation
Yoshimura, S. et al. (2023). Low-energy Ar+ ion-beam-induced chemical vapor deposition of silicon dioxide films using tetraethyl orthosilicate. Heliyon. 9 (4), p. . [Online].
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Yoshimura, S. et al. (2023). Low-energy Ar+ ion-beam-induced chemical vapor deposition of silicon dioxide films using tetraethyl orthosilicate. Heliyon. 9 (4), p. . [Online].