G‐C3N4 Monolayer/2D Mica Nanohybrids with Highly Effective UV–HEV‐Screening Function. Issue 12 (28th March 2023)

• Record Type: Journal Article
• Authors: Piao, Huiyan; Choi, Goeun; Rejinold, N. Sanoj; Vinu, Ajayan; Choy, Jin‐Ho
• Is Part Of: Advanced materials interfaces. Volume 10:Issue 12(2023)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2023-03-28
• Subjects: g‐C 3N 4 -- nanohybrid -- semiconductors -- insulator -- UV‐HEV screening; Materials science -- Periodicals; 620.11
• DOI: 10.1002/admi.202202486
• Languages: English
• ISSNs: 2196-7350

Abstract

Abstract: Excessive exposure to ultraviolet (UV) and high‐energy visible (HEV) light can cause sunburns, wrinkles, and even skin cancer. Therefore, the development of effective UV–HEV‐shielding agents is of great importance to human health. In this study, semiconducting graphitic carbon nitride (g‐C3 N4 ) is incorporated into the interlayer space of mica through the intercalation of cyanamide and subsequent pyrolysis reactions to form a semiconductor–insulator nanohybrid, namely g‐C3 N4 –mica, with a 1:1 heterostructure. The g‐C3 N4 –mica nanohybrid exhibits excellent UV–HEV absorption properties below 450 nm, and its photocatalytic activity is quenched owing to the effective screening of photocatalytic active sites by the insulating mica. It is strongly believed that the proposed g‐C3 N4 –mica nanohybrid can be applied as a UV–HEV blocking agent owing to its excellent UV–HEV (200–450 nm)‐screening property without any photocatalytic effect or phototoxicity. Abstract : In this study, a new semiconductor–insulator nanohybrid is developed by incorporating semiconducting graphitic carbon nitride (g‐C3 N4 ) into the interlayer space of mica through the intercalation of cyanamide and in situ polymerization reactions. A new function to block a wide range of UV and HEV (200–450 nm) without any photocatalytic effect and phototoxicity is identified.