Schottky barrier modulation of bottom contact SnO2 thin-film transistors via chloride-based combustion synthesis. (10th June 2023)
- Record Type:
- Journal Article
- Title:
- Schottky barrier modulation of bottom contact SnO2 thin-film transistors via chloride-based combustion synthesis. (10th June 2023)
- Main Title:
- Schottky barrier modulation of bottom contact SnO2 thin-film transistors via chloride-based combustion synthesis
- Authors:
- Jang, Bongho
Lee, Junhee
Kang, Hongki
Jang, Jaewon
Kwon, Hyuk-Jun - Abstract:
- Highlights: Crystalline Cl-doped SnO2 films were formed by chloride-based combustion synthesis. SnO2 TFTs obtained by combustion process showed significantly improved performance. The devices also exhibited linear IV properties at low V DS of the output curves. Increased carrier concentration with Cl doping could lead to thin potential barriers. The Schottky barrier was remarkably reduced by the enhanced tunneling carrier. Abstract: The enhanced carrier flow at the interface between Au and SnO2 semiconductors, which initially form Schottky contacts, is realized using chloride-based combustion synthesis. Chloride-based combustion systems can achieve chlorine (Cl) doping effects as well as conversion to crystalline SnO2 films at clearly lower temperatures (∼250 °C) than conventional precursors. Due to the Cl doping effect, the high carrier concentration can induce thin potential barriers at the metal/semiconductor (MS) junctions, resulting in carrier injection by tunneling. As a result, compared to conventional SnO2 thin-film transistors, the devices fabricated by combustion synthesis exhibit significantly improved electrical performance with field-effect mobility of 6.52 cm 2 /Vs (∼13 times), subthreshold swing of 0.74 V/dec, and on/off ratio of ∼10 7 below 300 °C. Furthermore, because of the enhanced tunneling carriers induced by the narrowed barrier width, the Schottky barriers are significantly reduced from 0.83 to 0.29 eV (65% decrease) at 250 °C and from 0.42 to 0.17 eVHighlights: Crystalline Cl-doped SnO2 films were formed by chloride-based combustion synthesis. SnO2 TFTs obtained by combustion process showed significantly improved performance. The devices also exhibited linear IV properties at low V DS of the output curves. Increased carrier concentration with Cl doping could lead to thin potential barriers. The Schottky barrier was remarkably reduced by the enhanced tunneling carrier. Abstract: The enhanced carrier flow at the interface between Au and SnO2 semiconductors, which initially form Schottky contacts, is realized using chloride-based combustion synthesis. Chloride-based combustion systems can achieve chlorine (Cl) doping effects as well as conversion to crystalline SnO2 films at clearly lower temperatures (∼250 °C) than conventional precursors. Due to the Cl doping effect, the high carrier concentration can induce thin potential barriers at the metal/semiconductor (MS) junctions, resulting in carrier injection by tunneling. As a result, compared to conventional SnO2 thin-film transistors, the devices fabricated by combustion synthesis exhibit significantly improved electrical performance with field-effect mobility of 6.52 cm 2 /Vs (∼13 times), subthreshold swing of 0.74 V/dec, and on/off ratio of ∼10 7 below 300 °C. Furthermore, because of the enhanced tunneling carriers induced by the narrowed barrier width, the Schottky barriers are significantly reduced from 0.83 to 0.29 eV (65% decrease) at 250 °C and from 0.42 to 0.17 eV (60% decrease) at 400 °C. Therefore, chloride-based combustion synthesis can contribute to developing SnO2 -based electronics and flexible devices by achieving both high-quality oxide films and improved current flow at the MS interface with low-temperature annealing. Graphical abstract: Image, graphical abstract … (more)
- Is Part Of:
- Journal of materials science & technology. Volume 148(2023)
- Journal:
- Journal of materials science & technology
- Issue:
- Volume 148(2023)
- Issue Display:
- Volume 148, Issue 2023 (2023)
- Year:
- 2023
- Volume:
- 148
- Issue:
- 2023
- Issue Sort Value:
- 2023-0148-2023-0000
- Page Start:
- 199
- Page End:
- 208
- Publication Date:
- 2023-06-10
- Subjects:
- SnO2 -- Combustion -- Sol-gel -- Schottky contact -- Thin-film transistors
Metals -- Periodicals
Materials science -- Periodicals
Materials science
Metals
Periodicals
620.1105 - Journal URLs:
- http://www.jmst.org/EN/volumn/home.shtml ↗
http://www.sciencedirect.com/science/journal/10050302 ↗
http://www.sciencedirect.com/ ↗ - DOI:
- 10.1016/j.jmst.2022.11.025 ↗
- Languages:
- English
- ISSNs:
- 1005-0302
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 26911.xml