A structural criterion for simulation of optimalion‐stimulated plasma growth of chained carbon. Issue 1 (6th October 2021)

• Record Type: Journal Article
• Authors: Buntov, Evgeny; Arslanov, Kirill
• Is Part Of: Plasma processes and polymers. Volume 19:Issue 1(2022)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2021-10-06
• Subjects: carbyne -- film growth -- molecular dynamics -- plasma deposition -- silicon substrate; Plasma polymerization -- Periodicals; Plasma-enhanced chemical vapor deposition -- Periodicals; Plasma chemistry -- Periodicals
• DOI: 10.1002/ppap.202100135
• Languages: English
• ISSNs: 1612-8850

Abstract

Abstract: The low‐dimensional carbon allotropes have become a prominent topic of research due to their unprecedented strength and prospective physical properties. The Ar + ion‐stimulated plasma deposition of the one‐dimensional carbon chains always presented a challenging task that still lacks a theoretical description. In this study, we propose a selective deposition quality criterion for the massive simulations planned to reveal the conditions for the synthesis of carbyne‐containing films, in particular, linear‐chained carbon by means of molecular dynamics. Abstract : The plasma deposition of the monoatomic carbon chains always presented a challenge lacking a theoretical description. Here, a deposition quality criterion for the large‐scale simulations is proposed to reveal the conditions for the synthesis of carbyne‐containing films, by means of molecular dynamics. The optimal values of the energy of argon ions, the angle of bombardment, and the flux density of argon ions were fitted against the chains build‐up probability on top of the silicon substrate