Applications of Atomic Layer Deposition in Design of Systems for Energy Conversion. Issue 39 (8th August 2021)

• Record Type: Journal Article
• Authors: Plutnar, Jan; Pumera, Martin
• Is Part Of: Small. Volume 17:Issue 39(2021)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2021-08-08
• Subjects: atomic layer deposition -- catalysis -- energy conversion; Nanotechnology -- Periodicals; Nanoparticles -- Periodicals; Microtechnology -- Periodicals; 620.5
• DOI: 10.1002/smll.202102088
• Languages: English
• ISSNs: 1613-6810

Abstract

Abstract: There is a huge demand for clean energy conversion in all industries. The clean energy production processes include electrocatalytic and photocatalytic conversion of water to hydrogen, carbon dioxide reduction, nitrogen conversion to ammonia, and oxygen reduction reaction and require novel cheap and efficient photo‐ and electrocatalysts and their scalable methods of fabrication. Atomic layer deposition is a thin film deposition method that allows to deposit thin layers of catalysts on virtually any surface of any shape, size, and porosity in an even and easy to control manner. Here the state of the art in applications of atomic layer deposition in the clean energy production and the opportunities it represents for the whole field of the photo‐ and electrocatalysis for a sustainable future are reviewed. Abstract : Atomic layer deposition (ALD) is a thin film deposition method that allows to deposit layers of catalysts on virtually any surface of any shape, size, and porosity in an easy to control manner. Here the state of the art in applications of ALD in the clean energy production and the opportunities it represents for the photo‐ and electrocatalysis are reviewed.