Confining the growth of mesoporous silica films into nanospaces: towards surface nanopatterning. Issue 4 (20th January 2022)

• Record Type: Journal Article
• Authors: Soulé, Samantha; Moehl, Gilles E.; Huang, Ruomeng; Noori, Yasir J.; Kiang, Kian Shen; Kees de Groot, C. H.; Beanland, Richard; Smith, David C.; Hector, Andrew L.
• Is Part Of: Nanoscale advances. Volume 4:Issue 4(2022)
• Page Start: 1105
• Page End: 1111
• Publication Date: 2022-01-20
• Subjects: 620.5
• DOI: 10.1039/d1na00654a
• Languages: English
• ISSNs: 2516-0230

Abstract

Abstract : Mesoporous silica was deposited into e-beam patterned substrates and mesochannel orientation was controlled into nanospaces by tuning the sol chemistry opening potentialities in the fabrication of nanowire-based devices. Abstract : The combination of lithographic methods and sol gel bottom-up techniques is a promising approach for nanopatterning substrates. The integration and scalable fabrication of such substrates are of great interest for the development of nanowire-based materials opening potentialities in new technologies. We demonstrate the deposition of ordered mesoporous silica into nanopatterned silica substrates by dip coating. Using scanning electron microscopy and grazing incidence small angle X-ray scattering, the effect of the sol composition on the pore ordering was probed. Optimising the sol composition using anodic alumina membranes as confined spaces, we showed how the pH controlled the transformation from circular to columnar mesophase. Vertical mesopores were obtained with very good repeatability. The effect of the sol chemistry on the surfactant curvature was then shown to be similar in nanopatterned substrates made by e-beam lithography.