Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography. Issue 19 (January 2020)

• Record Type: Journal Article
• Authors: Versolato, O; Bayerle, A; Bayraktar, M; Behnke, L; Bekker, H; Bouza, Z; Colgan, J; Crespo López-Urrutia, J R; Deuzeman, M J; Hoekstra, R; Kurilovich, D; Liu, B; Meijer, R; Neukirch, A; Poirier, L; Rai, S; Ryabtsev, A; Scheers, J; Schupp, R; Sheil, J; Torretti, F; Ubachs, W; Witte, S
• Is Part Of: Journal of physics. Volume 1412:Issue 19(2019)
• Publication Date: 2020-01
• Subjects: Physics -- Congresses; 530.5
• DOI: 10.1088/1742-6596/1412/19/192006
• Languages: English
• ISSNs: 1742-6588

Abstract

Synopsis: Highly charged tin ions are the sources of extreme ultraviolet (EUV) light at 13.5-nm wavelength in laser-produced transient plasmas for next-generation nanolithography. Generating this EUV light at the required power, reliability, and stability however presents a formidable task that combines industrial innovations with challenging scientific questions. We will present work on the spectroscopy of tin ions in and out of YAG-laser-driven plasma and present a surprising answer to the key question: what makes that light?