Cite
HARVARD Citation
Izyumskaya, N. et al. (2021). High‐Quality Plasmonic Materials TiN and ZnO:Al by Atomic Layer Deposition. Physica status solidi. 15 (10), p. n/a. [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Izyumskaya, N. et al. (2021). High‐Quality Plasmonic Materials TiN and ZnO:Al by Atomic Layer Deposition. Physica status solidi. 15 (10), p. n/a. [Online].