Cite
HARVARD Citation
Raghavan, R. et al. (2015). Transition from shear to stress-assisted diffusion of copper–chromium nanolayered thin films at elevated temperatures. Acta materialia. pp. 73-80. [Online].
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Raghavan, R. et al. (2015). Transition from shear to stress-assisted diffusion of copper–chromium nanolayered thin films at elevated temperatures. Acta materialia. pp. 73-80. [Online].