High-performance oxide thin-film diode and its conduction mechanism based on ALD-assisted interface engineering. Issue 4 (4th January 2023)
- Record Type:
- Journal Article
- Title:
- High-performance oxide thin-film diode and its conduction mechanism based on ALD-assisted interface engineering. Issue 4 (4th January 2023)
- Main Title:
- High-performance oxide thin-film diode and its conduction mechanism based on ALD-assisted interface engineering
- Authors:
- Yeom, Hye-In
Kim, Jingyu
Jeon, Guk-Jin
Park, Jeongwoo
Han, Dong Uk
Kim, Joohyeong
Kim, Kyung Min
Shong, Bonggeun
Park, Sang-Hee Ko - Abstract:
- Abstract : With in-depth analysis and the exact conduction mechanism, the oxide thin-film diodes were developed by ALD-assisted interface engineering. Abstract : Rectifying diodes have emerged as one of the promising components for advanced functional devices, including resistive random access memory and backplanes of active-matrix systems. Among various types of diodes, oxide thin film diodes have been extensively studied for their outstanding stability and rectifying characteristics. In this study, we developed a metal–oxide semiconductor–insulator–metal (MSIM) diode by atomic layer deposition-assisted interface engineering and obtained a high on–off ratio of ∼10 8, low off-current density of 10 −9 A cm −2 and good reliability. For the first time, the operation mechanism of the MSIM diode was also scrutinized with chemical analyses. X-Ray photoelectron spectroscopy and density functional theory results indicate that trimethylaluminum induced oxygen vacancies at the interface between InO x and Al2 O3 through a reduction reaction during Al2 O3 deposition. The induced oxygen vacancies promote the formation of abundant tail states near the interface, and the tail states contribute to the injection of electrons from the cathode into Al2 O3 . From chemical and electrical analyses, suitable conduction mechanism and energy band diagram of the MSIM diode were proposed in detail. Consequently, the MSIM diode has been successfully demonstrated on a flexible polyimide substrateAbstract : With in-depth analysis and the exact conduction mechanism, the oxide thin-film diodes were developed by ALD-assisted interface engineering. Abstract : Rectifying diodes have emerged as one of the promising components for advanced functional devices, including resistive random access memory and backplanes of active-matrix systems. Among various types of diodes, oxide thin film diodes have been extensively studied for their outstanding stability and rectifying characteristics. In this study, we developed a metal–oxide semiconductor–insulator–metal (MSIM) diode by atomic layer deposition-assisted interface engineering and obtained a high on–off ratio of ∼10 8, low off-current density of 10 −9 A cm −2 and good reliability. For the first time, the operation mechanism of the MSIM diode was also scrutinized with chemical analyses. X-Ray photoelectron spectroscopy and density functional theory results indicate that trimethylaluminum induced oxygen vacancies at the interface between InO x and Al2 O3 through a reduction reaction during Al2 O3 deposition. The induced oxygen vacancies promote the formation of abundant tail states near the interface, and the tail states contribute to the injection of electrons from the cathode into Al2 O3 . From chemical and electrical analyses, suitable conduction mechanism and energy band diagram of the MSIM diode were proposed in detail. Consequently, the MSIM diode has been successfully demonstrated on a flexible polyimide substrate without degradation of rectifying characteristics, providing the potential of the MSIM diode as an advanced electronic device. … (more)
- Is Part Of:
- Journal of materials chemistry. Volume 11:Issue 4(2022)
- Journal:
- Journal of materials chemistry
- Issue:
- Volume 11:Issue 4(2022)
- Issue Display:
- Volume 11, Issue 4 (2022)
- Year:
- 2022
- Volume:
- 11
- Issue:
- 4
- Issue Sort Value:
- 2022-0011-0004-0000
- Page Start:
- 1336
- Page End:
- 1345
- Publication Date:
- 2023-01-04
- Subjects:
- Materials -- Periodicals
Chemistry, Analytic -- Periodicals
Optical materials -- Research -- Periodicals
Electronics -- Materials -- Research -- Periodicals
543.0284 - Journal URLs:
- http://pubs.rsc.org/en/journals/journalissues/tc# ↗
http://www.rsc.org/ ↗ - DOI:
- 10.1039/d2tc03751c ↗
- Languages:
- English
- ISSNs:
- 2050-7526
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5012.205300
British Library DSC - BLDSS-3PM
British Library STI - ELD Digital store - Ingest File:
- 26020.xml