Fabrication of High‐Quality Thin Single‐Crystal Diamond Membranes with Low Surface Roughness. Issue 4 (11th December 2022)

• Record Type: Journal Article
• Authors: Heupel, Julia; Pallmann, Maximillian; Körber, Jonathan; Hunger, David; Reithmaier, Johann Peter; Popov, Cyril
• Other Names: Nesládek Miloš guestEditor.; Pobedinskas Paulius guestEditor.
• Is Part Of: Physica status solidi. Volume 220:Issue 4(2023)
• Page Start: n/a
• Page End: n/a
• Publication Date: 2022-12-11
• Subjects: etching -- membranes -- micro-masking -- polishing damage -- roughness reduction -- single-crystal diamond; Solid state physics -- Periodicals; Solids -- Industrial applications -- Periodicals; 530.41
• DOI: 10.1002/pssa.202200465
• Languages: English
• ISSNs: 1862-6300

Abstract

Abstract : Certain aspects before and during the fabrication of single‐crystal diamond (SCD) membranes are highlighted, which are decisive to obtain high‐quality membranes with low surface roughness values around 0.2 nm on a small area scale. In addition to the requirements for the starting material, including a high planarity and a moderate surface roughness, the importance of cleaning processes to minimize particles and impurities before and during the structuring is emphasized. With the help of a planarization procedure, consisting of a combination of different Ar/Cl2 recipes with low etch rates, surface defects like grooves due to polishing are minimized and smooth surfaces are acquired. Severe micro‐masking can be prevented by the application of a cyclic Ar/Cl2 + O2 recipe, allowing finally the fabrication of defect‐minimized and planarized SCD membranes in the thickness range between a few microns and a few hundred nanometers. The high quality of the structured SCD membranes is evidenced with a morphological as well as optical characterization via fiber‐based microcavity measurements. Abstract : With a planarization procedure, exploiting the Ar/Cl2 chemistry by distinct inductively coupled plasma reactive ion etching (ICP‐RIE) recipes, surface defects, originating from polishing, can be minimized to yield smooth surfaces. These can be utilized to structure high‐quality thin single‐crystal diamond (SCD) membranes with a local low surface roughness down to 0.2 nm.