Cite
HARVARD Citation
Schätzle, P. et al. (2023). A Chemical Vapor Deposition Diamond Reactor for Controlled Thin‐Film Growth with Sharp Layer Interfaces. Physica status solidi. 220 (4), p. n/a. [Online].
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Schätzle, P. et al. (2023). A Chemical Vapor Deposition Diamond Reactor for Controlled Thin‐Film Growth with Sharp Layer Interfaces. Physica status solidi. 220 (4), p. n/a. [Online].