Cite
HARVARD Citation
Xu, J. et al. (2023). Discharge characterization and technological application of an arc ion plating with a hollow cathode vacuum arc. Journal of adhesion science and technology. 37 (4), pp. 649-662. [Online].
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Xu, J. et al. (2023). Discharge characterization and technological application of an arc ion plating with a hollow cathode vacuum arc. Journal of adhesion science and technology. 37 (4), pp. 649-662. [Online].