Control of ion flux-energy distribution at dielectric wafer surfaces by low frequency tailored voltage waveforms in capacitively coupled plasmas. (2nd February 2023)

• Record Type: Journal Article
• Authors: Hartmann, P; Korolov, I; Escandón-López, J; van Gennip, W; Buskes, K; Schulze, J
• Is Part Of: Journal of physics. Volume 56:Number 5(2023)
• Publication Date: 2023-02-02
• Subjects: capacitively coupled plasmas -- low frequency and high voltage discharges -- plasma-surface interactions -- tailored voltage waveforms -- dielectric wafer charging/etching; Physics -- Periodicals; 530
• DOI: 10.1088/1361-6463/acacaa
• Languages: English
• ISSNs: 0022-3727

Abstract

Abstract: Capacitively coupled plasmas are routinely used in an increasing number of technological applications, where a precise control of the flux and energy distribution of ions impacting boundary surfaces is required. In the presence of dielectric wafers and targets the accumulation of charges on these surfaces can significantly alter the time evolution of the sheath electric field that is accountable for ion acceleration from the plasma bulk to the surfaces and, thus, lead to parasitic distortions of process relevant ion flux-energy distributions. We apply particle in cell with Monte Carlo collisions simulations to provide insights into the operation, ion acceleration mechanisms, and the formation of such distributions at dielectric wafers for discharges in argon gas. The discharges are driven by a combination of a single high frequency (HF) (27.1 MHz) voltage signal and a low frequency (LF) (100 kHz) customized pulsed voltage waveform. The LF waveform includes a base square signal to realize narrow and controllable high energy peaks of the ion distribution, and steady-slope ramp voltage components. We discuss the distorting effect of dielectric surface charging on the ion flux-energy distribution and provide details about how the voltage ramps can restore its narrow peaked shape. The dependence of the surface charging properties on the LF pulse duty cycle and amplitude, as well as the HF voltage amplitude is revealed. The radial homogeneity of the ion flux is found to be maintained within ± 10 % around the mean value for all quantities investigated. The radial electric field developing at the edge of the dielectric wafer with finite width has only a small influence on the overall homogeneity of the plasma across the whole surface, its effect remains localized to the outermost few mm of the wafer.