Significant Improvement of Switching Characteristics in a 1.2‐kV SiC SWITCH‐MOS by the Application of Kelvin Source Connection. Issue 2 (17th October 2022)
- Record Type:
- Journal Article
- Title:
- Significant Improvement of Switching Characteristics in a 1.2‐kV SiC SWITCH‐MOS by the Application of Kelvin Source Connection. Issue 2 (17th October 2022)
- Main Title:
- Significant Improvement of Switching Characteristics in a 1.2‐kV SiC SWITCH‐MOS by the Application of Kelvin Source Connection
- Authors:
- Matsui, Kevin
Tawara, Takeshi
Harada, Shinsuke
Tanaka, So
Sato, Hiroshi
Yano, Hiroshi
Iwamuro, Noriyuki - Abstract:
- Abstract : Here we show, for the first time, a significant improvement of switching characteristics in a 1.2‐kV SiC Schottky barrier diode‐wall integrated trench MOSFET (SWITCH‐MOS) by the application of a Kelvin source (KS) connection. Turn‐on loss ( E on ) was greatly reduced, with superior E on ‐d V DS /d t trade‐off characteristics at a moderate d V DS /d t value of about 10 kV/μs, because the SWITCH‐MOS with KS achieves a more suppressed peak reverse recovery current in embedded Schottky barrier diodes even at a higher d I D /d t during the turn‐on operation than a state‐of‐the‐art SiC trench MOSFET with KS. This feature is a peculiarity of the SWITCH‐MOS when the KS connection is applied. Notably, measured and calculated results confirmed that the SWITCH‐MOS with KS had less dissipated turn‐off loss, especially in a second half of turn‐off regions (Region 2), than the SWITCH‐MOS w/o KS. However, owing to a higher negative turn‐off d I D /d t, the MOSFET with KS has a larger drain surge voltage. With an optimum gate resistance, the SWITCH‐MOS with KS has 8% less total switching loss than a SWITCH‐MOS without KS, and 29% less than a state‐of‐the‐art SiC trench MOSFET with KS, while keeping a moderately low d V DS /d t of 10 kV/μs and suppressing a drain peak voltage of <720 V. © 2022 Institute of Electrical Engineers of Japan. Published by Wiley Periodicals LLC.
- Is Part Of:
- IEEJ transactions on electrical and electronic engineering. Volume 18:Issue 2(2023)
- Journal:
- IEEJ transactions on electrical and electronic engineering
- Issue:
- Volume 18:Issue 2(2023)
- Issue Display:
- Volume 18, Issue 2 (2023)
- Year:
- 2023
- Volume:
- 18
- Issue:
- 2
- Issue Sort Value:
- 2023-0018-0002-0000
- Page Start:
- 278
- Page End:
- 285
- Publication Date:
- 2022-10-17
- Subjects:
- kelvin source connection -- SBD‐integrated SiC trench MOSFET -- silicon carbide -- surge voltage -- turn‐on loss -- turn‐off loss
Electrical engineering -- Periodicals
Electronics -- Periodicals
621.3 - Journal URLs:
- http://onlinelibrary.wiley.com/ ↗
- DOI:
- 10.1002/tee.23727 ↗
- Languages:
- English
- ISSNs:
- 1931-4973
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 4363.240505
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British Library HMNTS - ELD Digital store - Ingest File:
- 25672.xml