Designing 3D Polymeric Structures through Capillary Wetting on Colloidal Monolayer. (30th October 2022)
- Record Type:
- Journal Article
- Title:
- Designing 3D Polymeric Structures through Capillary Wetting on Colloidal Monolayer. (30th October 2022)
- Main Title:
- Designing 3D Polymeric Structures through Capillary Wetting on Colloidal Monolayer
- Authors:
- Lee, Hyeong Jun
Park, Sanghyuk
Kim, Jong Bin
Kim, Shin‐Hyun - Abstract:
- Abstract: Colloidal lithography has provided a facile means to create regular micro‐ and nano‐patterns by employing colloidal crystals as masks. However, the patterns are usually restricted to 2D as most techniques do not exploit the spherical shape of colloidal masks. Here, 3D structures are designed by utilizing capillary wetting of liquified photoresists on colloidal monolayers of silica particles. The silica particles are anchored at planar air‐photoresist interfaces to have an equilibrium contact angle without interfacial deformation for thick polymer layers. By contrast, when the polymer layers are thin enough, they wet the colloidal monolayer by forming periodic wavy interfaces to provide a constant Laplace pressure. The photo‐crosslinking of the photoresist and subsequent removal of silica particles leave behind periodic nanostructures with 3D‐undulated surfaces. Importantly, the structure and waviness are further controllable by adjusting the polymer thickness relative to the particle radius. As the shape of the interface is determined by capillarity, the 3D structures are reproducible as long as the dimension is smaller than the capillary length. The use of photoresists enables the production of micropatterns of the periodic wavy structures by photolithography. As one of the potential applications, structurally‐colored patterns are demonstrated with enhanced plasmonic and diffraction colors. Abstract : 3D undulated surfaces are directly created by capillary wettingAbstract: Colloidal lithography has provided a facile means to create regular micro‐ and nano‐patterns by employing colloidal crystals as masks. However, the patterns are usually restricted to 2D as most techniques do not exploit the spherical shape of colloidal masks. Here, 3D structures are designed by utilizing capillary wetting of liquified photoresists on colloidal monolayers of silica particles. The silica particles are anchored at planar air‐photoresist interfaces to have an equilibrium contact angle without interfacial deformation for thick polymer layers. By contrast, when the polymer layers are thin enough, they wet the colloidal monolayer by forming periodic wavy interfaces to provide a constant Laplace pressure. The photo‐crosslinking of the photoresist and subsequent removal of silica particles leave behind periodic nanostructures with 3D‐undulated surfaces. Importantly, the structure and waviness are further controllable by adjusting the polymer thickness relative to the particle radius. As the shape of the interface is determined by capillarity, the 3D structures are reproducible as long as the dimension is smaller than the capillary length. The use of photoresists enables the production of micropatterns of the periodic wavy structures by photolithography. As one of the potential applications, structurally‐colored patterns are demonstrated with enhanced plasmonic and diffraction colors. Abstract : 3D undulated surfaces are directly created by capillary wetting of molten polymer on particle monolayers. The surface shape is determined by constant Laplace pressure to have constant mean curvature, where waviness is controllable with the relative volume of the polymer to particles. The wavy structures are micro‐patternable by photolithography and their dimensions can be increased up to the capillary length. … (more)
- Is Part Of:
- Advanced functional materials. Volume 33:Number 1(2023)
- Journal:
- Advanced functional materials
- Issue:
- Volume 33:Number 1(2023)
- Issue Display:
- Volume 33, Issue 1 (2023)
- Year:
- 2023
- Volume:
- 33
- Issue:
- 1
- Issue Sort Value:
- 2023-0033-0001-0000
- Page Start:
- n/a
- Page End:
- n/a
- Publication Date:
- 2022-10-30
- Subjects:
- capillary wetting -- colloidal lithography -- colloidal monolayers -- laplace pressure -- photolithography
Materials -- Periodicals
Chemical vapor deposition -- Periodicals
620.11 - Journal URLs:
- http://onlinelibrary.wiley.com/journal/10.1002/(ISSN)1616-3028 ↗
http://onlinelibrary.wiley.com/ ↗ - DOI:
- 10.1002/adfm.202208402 ↗
- Languages:
- English
- ISSNs:
- 1616-301X
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 0696.853900
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 25600.xml