(Invited) FinFET Technology. (1st August 2017)
- Record Type:
- Journal Article
- Title:
- (Invited) FinFET Technology. (1st August 2017)
- Main Title:
- (Invited) FinFET Technology
- Authors:
- Cheng, Kangguo
- Abstract:
- Abstract : This paper provides an overview of FinFET technology, including its unique advantages and challenges in device design and fabrication. Common myths on FinFET are clarified. A methodology to decipher the confusing FinFET technology node names is shared. Potential solutions to further scaling FinFET are discussed. The comparison between FinFET and other existing and emerging devices and materials is performed from manufacturing perspectives.
- Is Part Of:
- ECS transactions. Volume 80:Number 4(2017)
- Journal:
- ECS transactions
- Issue:
- Volume 80:Number 4(2017)
- Issue Display:
- Volume 80, Issue 4 (2017)
- Year:
- 2017
- Volume:
- 80
- Issue:
- 4
- Issue Sort Value:
- 2017-0080-0004-0000
- Page Start:
- 17
- Page End:
- 31
- Publication Date:
- 2017-08-01
- Subjects:
- Electrochemistry -- Periodicals
Electrochemistry
Periodicals
Electronic journals
Electronic journal
541.37 - Journal URLs:
- http://ecsdl.org/ECST/ ↗
http://rzblx1.uni-regensburg.de/ezeit/warpto.phtml?colors=7&jour_id=81944 ↗
https://iopscience.iop.org/journal/1938-5862 ↗
http://www.electrochem.org/ ↗ - DOI:
- 10.1149/08004.0017ecst ↗
- Languages:
- English
- ISSNs:
- 1938-5862
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 25559.xml