Cite
HARVARD Citation
Veloso, A. et al. (2017). (Invited) Challenges on Surface Conditioning in 3D Device Architectures: Triple-Gate FinFETs, Gate-All-Around Lateral and Vertical Nanowire FETs. ECS transactions. pp. 3-20. [Online].
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Veloso, A. et al. (2017). (Invited) Challenges on Surface Conditioning in 3D Device Architectures: Triple-Gate FinFETs, Gate-All-Around Lateral and Vertical Nanowire FETs. ECS transactions. pp. 3-20. [Online].