Research on high robustness 4.5kV FRD chip. Issue 4 (April 2020)

• Record Type: Journal Article
• Authors: Liu, Jiang; He, Feng; Liu, Yueyang; Jin, Rui; Dong, Shaohua; Gao, Mingchao
• Is Part Of: Journal of physics. Volume 1486:Issue 4(2020)
• Publication Date: 2020-04
• Subjects: Physics -- Congresses; 530.5
• DOI: 10.1088/1742-6596/1486/4/042017
• Languages: English
• ISSNs: 1742-6588

Abstract

Abstract: A robustness 4500V/100A FRD with was designed by simulation and verified by experiment. The chip composed with optimized carrier density cell area and ruggedness terminal area. The cell area composed of P-body/N-sub/N+ layers, has good static and dynamic trade off characteristics by carefully design. The simulation show that there was no difference between conventional multi-deep P-ring terminal and multi-deep P-ring plus inner field plate terminal. Both terminals have the same width and almost the same breakdown voltage, low electric field and etc.by simulation.The experiment show that different terminal chips have almost the same trade off characters but different in reliability test, the inner field plate terminal pass 1000H HTRB test while the conventional multi-deep P-ring terminal failed at 168H HTRB test.